$45.00
Hydrofluoric Acid and DI Water, 1:20 custom mix is an aqueous solution consisting of hydrofluoric acid diluted with deionized water. This solution is used within semiconductor cleaning processes.
This solution:
This product is supplied for industrial and semiconductor processing use. Proper handling and use in accordance with applicable safety procedures and regulations is the responsibility of the end user.
| Chemical Components | Hydrofluoric Acid, Deionized Water |
| Mix Ratio | 1:20 |
| Form | Aqueous solution |
| Typical End Use | Silicon wafer cleaning |
| Volume | 100 mL |
$45.00
Hydrofluoric Acid and DI Water, 1:20 custom mix is an aqueous solution consisting of hydrofluoric acid diluted with deionized water. This solution is used within semiconductor cleaning processes.
This solution:
This product is supplied for industrial and semiconductor processing use. Proper handling and use in accordance with applicable safety procedures and regulations is the responsibility of the end user.
| Chemical Components | Hydrofluoric Acid, Deionized Water |
| Mix Ratio | 1:20 |
| Form | Aqueous solution |
| Typical End Use | Silicon wafer cleaning |
| Volume | 100 mL |