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Lab Pro Hydrofluoric Acid and DI Water, 1:20 custom mix, 100ml

$45.00
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SKU: HF0120-100
California prop 65
Description
  • Product Name
    Hydrofluoric Acid and DI Water, 1:20 Custom Mix
  • Mix Ratio
    1:20 (HF : DI Water)
  • Components
    Hydrofluoric Acid, Deionized Water
  • Form
    Aqueous Solution
  • Volume
    100 mL

Description

What is Hydrofluoric Acid and DI Water, 1:20 Custom Mix?

Hydrofluoric Acid and DI Water, 1:20 custom mix is an aqueous solution consisting of hydrofluoric acid diluted with deionized water. This solution is used within semiconductor cleaning processes.

This solution:

  • Combines hydrofluoric acid (HF) and deionized water (DIW)
  • Is used as a diluted hydrofluoric acid solution
  • Is associated with wafer cleaning systems in semiconductor fabrication

Key Features

  • Hydrofluoric acid diluted with deionized water
  • 1:20 HF to DI water ratio
  • Aqueous solution
  • Custom mixed
  • Used in semiconductor cleaning operations

Common Applications

  • Wafer cleaning processes in semiconductor fabrication
  • Use in spray acid chambers
  • Interface-controlled chemical delivery systems
  • Cleaning steps requiring diluted hydrofluoric acid

Packaging Details

  • Packaged In: 100 mL container
  • Includes: Single unit

Legal & Safety Notice

This product is supplied for industrial and semiconductor processing use. Proper handling and use in accordance with applicable safety procedures and regulations is the responsibility of the end user.

Standards and Certifications

  • Lab Pro CofA
  • Lab Pro SDS
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Properties

Chemical Components Hydrofluoric Acid, Deionized Water
Mix Ratio 1:20
Form Aqueous solution
Typical End Use Silicon wafer cleaning
Volume 100 mL


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FAQs

What is the 1:20 hydrofluoric acid to DI water custom mix used for?

This 1:20 custom mix of hydrofluoric acid and DI water is used in semiconductor fabrication processes, particularly for silicon wafer cleaning. The diluted HF solution supports controlled oxide removal and surface preparation in spray acid chambers and interface-controlled chemical delivery systems.

What does a 1:20 mix ratio mean?

A 1:20 ratio means one part hydrofluoric acid is diluted with twenty parts deionized water. This controlled dilution reduces acid strength while maintaining effective cleaning performance, making it suitable for precision semiconductor processes that require careful control of etching and surface reactions.

Why is deionized water used in this solution?

Deionized water is used to minimize ionic and particulate contamination during semiconductor processing. Its high purity helps ensure consistent chemical behavior and protects sensitive wafer surfaces, which is critical in fabrication environments where contamination can impact yield and device performance.

Is this hydrofluoric acid solution ready to use?

Yes, this product is supplied as a custom-mixed, ready-to-use aqueous solution. It eliminates the need for on-site dilution, reducing handling risks and supporting consistent concentration control within semiconductor cleaning and processing workflows.

How should this solution be handled and stored?

This solution contains hydrofluoric acid and must be handled using specialized PPE, proper ventilation, and approved safety procedures. Store in compatible containers within designated chemical areas. Always follow facility protocols and the Safety Data Sheet for safe handling, storage, and emergency response.